Photo Acid Generators

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3M™ PAG Anions are experimental non-PFOS photo-acid generator anions designed especially for use in semiconductor photoresists. When combined with various cations, these anions offer high acid strength, excellent solubility in resins and solvents, high purity, high thermal stability and low volatility.

Product Families

In principle, any photo-active cation may be combined with any 3M anion. A variety of experimental 3M PAG anions are available to meet your specific requirements. Please contact 3M at (65) 6450 8855 or contact us via email for the latest information.